Lewis-Acid Doping of Triphenylamine-Based Hole Transport Materials Improves the Performance and Stability of Perovskite Solar Cells
                                
                                    by
                                    Jiang Liu, Wenzhu Liu, Erkan Aydin, George T. Harrison, Furkan H. Isikgor, Xinbo Yang, Anand S. Subbiah, Stefaan De Wolf
                                
                                                        
                                            Research Article
                                                                            
                                            Year:
                                            2020
                                        
                                                                                                                
                                            DOI:
                                            https://doi.org/10.1021/acsami.0c03660
                                        
                                
                                                    
                                Bibliography
                                
                                    Liu, J., Liu, W., Aydin, E., Harrison, G. T., Isikgor, F. H., Yang, X., Subbiah, A. S., De Wolf, S. (2020). Lewis-Acid Doping of Triphenylamine-Based Hole Transport Materials Improves the Performance and Stability of Perovskite Solar Cells. ACS Applied Materials & Interfaces.
                                
                             
                                                    
                                
                                    Extra Information
                                
                                
                                    This study, which came out in the recent issue of ACS Applied Materials & Interfaces, successfully demonstrates the Lewis-acid (TPFB) doping of the widely used spiro-OMeTAD hole transport materials for perovskite solar cells to. This dopant replaces the conventional LiTFSI/tBP doping. By doing so, the device stability is increased and processing is simplified.